Method for engraving and/or etching with image-carrying mask and photo-sensitive laminate film for use in making the mask

A method for engraving and/or etching a material comprising the following steps:

• (a) exposing to light a water-soluble resin composition layer of a photo-sensitive laminate film comprising a supporting sheet, an image mask-protection layer peelably adhered to the supporting sheet, and a layer of a water-soluble resin composition having photocrosslinkability, said water-soluble resin composition selected from the group consisting of an acetal-modified polyvinyl alcohol having stilbazolium groups introduced therein, polyvinyl alcohol and a sulfate, hydrochloride, nitrate or phosphate of a condensate of 1-diazophenylamine with paraformaldehyde, to thus cause crosslinking of the exposed area of the resin layer to thereby form a predetermined pattern on the resin layer;
• (b) dissolving out the non-crosslinked portion on the layer of the water-soluble photo-sensitive resin composition by developing the layer with water to thus form an image-carrying mask constituted from the crosslinked area of the photo-sensitive resin composition remaining on the image mask-protection layer;
• (c) adhering the photo-sensitive laminate film on which the images are formed to the surface of the material to be processed;
• (d) peeling off the supporting sheet from the photo-sensitive laminate film, and
• (e) engraving and/or etching the material to be processed through the image-carrying mask adhered to the material.