Positive photoresist composition
AssigneeFuji Photo Film Co., Ltd.
InventorsKoji Shirakawa, Kenichiro Sato, Kunihiko Kodama, Yasumasa Kawabe, Shinji Sakaguchi
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Abstract
A positive photoresist composition is described, which comprises an alkali-soluble resin and 1,2-naphthoquinone-diazido-5-(and/or -4-)sulfonate of a polyhydroxy compound represented by the following formula (I): ##STR1## wherein R.sub.1 to R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group; A represents -CH(R.sub.12)-, in which R.sub.12 represents a hydrogen atom or an alkyl group; and m represents 2 or 3.
Claims10
A positive photoresist composition comprising, in admixture, an alkali-soluble resin and [1,2-naphthoquinonediazido-5-(and/or-4-)sulfonate of a polyhydroxy compound represented by the following formula (I)] at least one of a 1,2-naphthoquinonediazido-5-sulfonate of polyhydroxy compound represented by the following formula (I) and a 1,2-naphthoquinonediazido-4-sulfonate of a polyhydroxy compound represented by the following formula (I):
- ##STR25## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4, R.sub.5, R.sub.6, R.sub.7, R.sub.8, R.sub.9, R.sub.10 and R.sub.11 are the same or different and each represents a hydrogen atom, a halogen atom, an alkyl group, an aryl group, an alkoxyl group, an acyl group or a cycloalkyl group, provided that at least one of R.sub.1 to R.sub.11 is a cycloalkyl group;
- A represents ##STR26## in which R.sub.12 represents a hydrogen atom or an alkyl group;
- and m represents 2 or 3.
Dependencies are inferred from the claim text.