Exposure mask and method and apparatus for manufacturing the same

A method of manufacturing an exposure mask, comprising the steps of:

• forming a translucent film having a specific transmittance and producing a phase difference of (2n+1).pi., in which n stands for an integer, against an exposure light through a light-transmitting substrate on the light-transmitting substrate;
• forming a photosensitive resin film on said translucent film;
• forming a photosensitive resin pattern by exposing said photosensitive resin film to a radiation or a charged particle beam;
• removing an exposed portion of said translucent film by using said photosensitive resin pattern as a mask;
• removing said photosensitive resin pattern;
• and
• stabilizing said translucent film before the step of forming said photosensitive resin pattern by executing at least one treatment selected from the group consisting of irradiation, heating, and oxidation, thereby preventing variations in physical properties of said translucent film.

A method of manufacturing an exposure mask, comprising the steps of:

• forming a translucent film having a specific transmittance and producing a phase difference of (2n+1).pi., which n stands for integer, against an exposure light through a light-transmitting substrate on the light-transmitting substrate;
• forming a photosensitive resin film on said translucent film;
• forming a photosensitive resin pattern by exposing said photosensitive resin film to a radiation or a charged particle beam;
• removing an exposed portion of said translucent film by using said photosensitive resin pattern as a mask;
• removing said photosensitive resin pattern;
• and
• forming a stabilized region in a boundary between said light-transmitting substrate and said translucent film or on at least a surface of said translucent film before the step of forming said photosensitive resin film or after the step of forming said photosensitive resin pattern.