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US 5,628,882 AGranted
Method for sputter deposition of a chromium, carbon and fluorine crystalline films
AssigneeThe United States of America as represented by the Secretary of the Air Force
InventorsMatthew J. O'Keefe, J. Michael Rigsbee
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Abstract
System and method for plasma-assisted deposition of optically transparent, crystalline chromium/carbon/fluorine films are described using a chromium metal source and an argon/fluorocarbon plasma. The films were optically transparent to the unaided eye. Characterization of the material by electron diffraction showed the chromium/carbon/fluorine material to be crystalline.
Claims4
A method for sputter deposition of a crystalline film of chromium, carbon and fluorine, comprising the steps of:
- (a) providing a sputtering chamber and a chromium sputter target and substrate disposed therein;
- (b) providing a source of argon;
- (c) providing a source of hexafluoroethane;
- (d) flowing argon from said source of argon at a flow rate of 100 to 200 sccm and flowing hexaflouroethane at a flow rate of 0.2 to 1.0 sccm whereby the ratio of the argon flow rate to the hexafluoroethane flow is the range of 100:1 to 1000:1;
- and
- (e) sputtering said chromium from said target to said substrate under said flow rates of said argon and said hexafluoroethane.
3 more elements
Dependencies are inferred from the claim text.