Pattern projecting method
AssigneeSony Corporation
InventorTohru Ogawa
Life of this patent
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Abstract
A pattern projecting method is disclosed. The pattern projecting method has the step of illuminating a mask having a fine pattern formed therein with an exposure light and causing a transmitted light of the mask to be incident on a pupil of a projection optical system to project an image of the fine pattern onto a substrate, the illuminating step using an effective light source capable of achieving such light intensity distribution as to provide a predetermined light intensity in a central region of the pupil, a maximum light intensity in plural peripheral regions around the central region, and a light intensity lower than the maximum light intensity in a region connecting the plural regions.
Claims9
A pattern projecting method comprising the steps of:
- illuminating a mask having a fine pattern formed therein with an exposure light;
- and
- transmitting a light of the mask to be incident on a pupil of a projection optical system to project an image of the fine pattern onto a substrate with a light intensity distribution having a maximum light intensity in plural peripheral regions around a central region of the pupil, a predetermined light intensity of 20 to 50% of the maximum light intensity in said central region, and a light intensity lower than the maximum light intensity in a region connecting the plural regions.
Dependencies are inferred from the claim text.