Photoimageable resist compositions containing photobase generator
AssigneeShipley Company, L.L.C.
InventorsDaniel Y. Pai, Stephen S. Rodriguez, Kevin J. Cheetham, Gary S. Calabrese, Roger F. Sinta
Life of this patent
Estimating the term…
Abstract
A radiation sensitive composition, process for using said composition, and substrates coated with said composition. The photoimageable composition comprises a photobase generator compound, a resin binder and a material capable of crosslinking in the presence of base. In preferred aspects, the invention provides a negative-acting, aqueous developable photoimageable composition comprising a photobase generator compound, a resin binder which preferably is a phenolic polymer, a crosslinking agent that comprises one or more active groups that will undergo base-initiated crosslinking, and a curing agent.
Claims36
An aqueous developable negative acting photoimageable resist composition that undergoes photobase-initiated hardening to produce a negative relief image upon exposure and development, the composition comprising an organic photobase generator compound, an aqueous base soluble resin binder selected from the group consisting of a novolak resin, a poly(vinylphenol) resin, a resin containing phenolic units and cyclic alcohol units, an acrylic resin, a resin having acrylic and phenolic units and a blend of an acrylic resin with a phenolic resin, and a compound that crosslinks with the resin binder in the presence of a base, said photobase generator compound being present in an amount sufficient to crosslink said compound with said resin binder to enable development of a coating layer of the photoimageable resist composition following exposure to activating radiation, the composition being free of an acid or acid generating material.
An aqueous developable negative-acting photoimageable resist composition that undergoes photobase-initiated hardening to produce a negative relief image upon exposure and development, the composition comprising an aqueous base soluble resin binder selected from the group consisting of novolak resins and poly(vinylphenol) resins, a photobase generator compound in an amount sufficient to crosslink said compound with said resin binder to enable development of a coating layer of the photoimageable resist coating following exposure to activating radiation, and a compound that crosslinks with the resin binder in the presence of a base in an amount sufficient to crosslink said compound with said resin binder, the crosslinking compound comprising one or more epoxy groups, said composition being free of an acid or an acid generating material.
An aqueous developable negative-acting photoimageable resist composition that undergoes photobase-initiated hardening to produce a negative relief image upon exposure and development, the composition comprising an aqueous base soluble resin binder selected from the group consisting of novolak resins and poly(vinylphenol) resins, a photobase generator compound that yields an organic base upon exposure to activating radiation in an amount sufficient to crosslink said compound with said resin binder to enable development of a coating layer of the photoimageable resist coating following exposure to activating radiation, and a compound that crosslinks with the resin binder in the presence of an organic base in an amount sufficient to enable development of a coating layer of the photoimageable resist coating following exposure to activating radiation, the crosslinking compound comprising one or more electrophilic multiple bonds groups and being free of an acid or an acid generating material.
Dependencies are inferred from the claim text.