Vacuum exhaust system for processing apparatus
AssigneesTokyo Electron Limited, Tokyo Electron Tohoku Kabushiki Kaisha
InventorsJunichi Arami, Masayuki Kitamura, Mitsuaki Komino
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AssigneesTokyo Electron Limited, Tokyo Electron Tohoku Kabushiki Kaisha
InventorsJunichi Arami, Masayuki Kitamura, Mitsuaki Komino
Estimating the term…
A main pump having a wide range of vacuum exhaust capabilities and a high exhaust speed is connected adjacent to a processing chamber and an auxiliary pump having a low exhaust speed is connected by a small-diameter auxiliary pipeline to the exhaust side of the main pump. Since a main pump having a wide range of vacuum exhaust capabilities and a high exhaust speed is connected adjacent to the processing chamber in this manner, not only can improvements in the exhaust characteristics be expected, but it is also possible to reduce the diameter of the auxiliary pipeline from the main pump onward and make the auxiliary pump smaller. Since the auxiliary pump having a low exhaust speed is connected by a small-diameter auxiliary pipeline to the exhaust side of the main pump, the size and cost of the entire system can be reduced.
A vacuum exhaust system for a processing apparatus comprising:
A vacuum exhaust system for a processing apparatus comprising:
Dependencies are inferred from the claim text.