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US 5,552,925 AGranted
Electro-micro-mechanical shutters on transparent substrates
AssigneeJohn M. Baker
InventorEugene R. Worley
Life of this patent
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Abstract
A micro-mechanical shutter array using micro-mechanical technology and silicon-on-transparent-substrate technology. The micro-mechanical shutter array is operated by using electro-static forces. Two basic types of shutter movements are described, viz. an electric force/electric counter-force and an electric force/mechanical (spring) counter-force.
Claims28
Control apparatus for selectively blocking radiation comprising,
- substrate means which is transparent to a radiation signal,
- shutter means movably mounted on said substrate means,
- said shutter means fabricated of a material which is electrically conductive and non-transparent to said radiation signal,
- electrode means mounted on said substrate means adjacent to said shutter means,
- said electrode means fabricated of a material which is electrically conductive,
- gating means mounted on said substrate means and electrically connected to at least one of said shutter means and said electrode means, and
- signal supplying means mounted on said substrate means for supplying electric signals to said electrode means and to said shutter means via said gating means to selectively apply an electric force to said shutter means in order to move said shutter means relative to said substrate means.
4 more elements
Dependencies are inferred from the claim text.