Fabrication method for digital micro-mirror devices using low temperature CVD
AssigneeTexas Instruments Incorporated
InventorsWayne E. Bailey, James C. Baker
Life of this patent
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Abstract
An improved support post (16, 23) for micro-mechanical devices (10). A conductive layer (33, 71) is deposited on a substrate at all places where the support posts (16, 23) are to be located. A spacer layer (41, 81) is then deposited and etched to form vias (41a, 81a). Each via (41a, 81a) defines the outer surface of a support post (16, 23). The bottom surface of each via is at the conductive layer (33, 71). This permits an aluminum CVD process to selectively fill the vias (41a, 81a), thereby forming the support posts (16, 23).
Claims19
An improved method of fabricating a support post for a micro-mechanical device having at least one mechanical element supported by said support post, comprising the steps of:
- depositing a conductive layer on a substrate;
- depositing a spacer layer over said conductive layer;
- etching vias into said spacer layer, each via defining an outer surface of a support post, said etching step being performed through said spacer layer such that each said via is bottomed by said conductive layer;
- subjecting said spacer layer to an aluminum chemical vapor deposition on its surface;
- and
- continuing said subjecting step until said vias are filled with aluminum to a desired height.
An improved method of fabricating a support for digital micro-mirror device, said device having a substrate upon which mirror elements having the following elements are fabricated:
- a hinge support post, a hinge extending from said hinge support post, a mirror attached to said hinge, wherein said hinge is deformable so as to permit said mirror to deflect upon being subjected to an applied force, comprising the steps of:
- depositing a conductive layer on the substrate;
- depositing a spacer layer over said conductive layer;
- etching vias into said spacer layer, each via defining an outer surface of a hinge support post, said etching step being performed through said spacer layer such that each said via is bottomed by said conductive layer;
- subjecting said spacer layer to an aluminum chemical vapor deposition on its surface;
- and
- continuing said subjecting step until said vials are filled with aluminum to a desired height.
An improved method of fabricating a support post for a digital micro-mirror device, said device having a substrate upon which mirror elements having the following elements are fabricated:
- a hinge support post, a hinge extending from said support post, a yoke attached to said hinge, a mirror support post on said yoke, and a mirror mounted on said mirror support post, wherein said hinge is deformable so as to permit said mirror to deflect upon being subjected to an applied force, comprising the steps of:
- fabricating the hinge support posts by depositing a conductive layer on the substrate;
- depositing a first spacer layer over said conductive layer;
- etching vias into said first spacer layer, each via defining an outer surface of a hinge support post, said etching step being performed through said first spacer layer such that each said via is bottomed by said conductive layer;
- subjecting said first spacer layer to an aluminum chemical vapor deposition on its surface;
- and continuing said exposing step until said vias are filled with aluminum to a desired height;
- fabricating the hinges and the yokes;
- and
- fabricating the mirror support posts by depositing a second spacer layer over said yokes;
- etching vias into said second spacer layer, each via defining the outer surface of a mirror support post, said etching step being performed through said second spacer layer such that said yoke layer is at the bottom of each said via;
- exposing the top of said second spacer layer to an aluminum chemical vapor deposition;
- and continuing said exposing step until said vias arc filled with aluminum to a desired height.
Dependencies are inferred from the claim text.