Method for forming a light shielding pattern

A method for forming a light shielding pattern on a substrate having a front and a back and having a picture element pattern on its front comprising picture elements which have a single color or plural colors and do not contact each other, said method comprising in order:

• (1) forming a picture element pattern on the front of a substrate, said picture element pattern comprising picture elements having a single color or plural colors and having a periphery,
• (2) forming a photopolymerizable light shielding material layer on the front of the substrate having a picture element pattern comprising picture elements having a single color or plural colors,
• (3) exposing the photopolymerizable light shielding material layer through a mask which is light transmissive at portions corresponding to the periphery of the picture elements of the picture element pattern formed on the substrate and at portions at which no picture element is present,
• (4) developing the photopolymerizable light shielding material layer to form the light shielding pattern,
• (5) overall exposing from the back of the substrate, and
• (6) subjecting the light shielding pattern formed to side etching to remove any portion of the light shielding pattern which overlaps with the picture elements.