Radiation sensitive composition comprising polymer having inert blocking groups
AssigneeShipley Company, L.L.C.
InventorsJames W. Thackeray, George W. Orsula, Mark D. Denison, Roger Sinta, Sheri L. Ablaza
Life of this patent
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Abstract
A photoresist composition consisting of an acid or base generator, a crosslinking agent activated in the presence of an acid or base and an alkali soluble resin, preferably a phenolic resin, having a portion of its phenolic hydroxyl groups reacted to form a blocking group inert to acid or base. The presence of the inert blocking group enables development of an exposed photoresist with a strong developer without formation of microbridges between fine line features.
Claims19
A negative acting photoresist composition comprising the combination of a compound that generates an acid or base upon exposure to activating radiation and an acid or base activated crosslinking agent, and an alkali soluble resin binder, said combination of acid or base generator and crosslinking agent being present in an amount sufficient to crosslink said photoresist composition in areas exposed to activating radiation, and said alkali soluble resin having hydroxyl groups where a minor portion of the hydroxyl groups are reacted with a reactant to form a blocking group inert to acid or base.
A negative acting photoresist composition comprising the combination of a compound that generates an acid or base upon exposure to activating radiation and an acid or base activated crosslinking agent, and an alkali soluble resin binder conforming to a formula selected from the group consisting of:
- ##STR3## where Z is an alkylene bridge having from 1 to 3 carbon atoms;
- each A is a substituent on the aromatic ring replacing a hydrogen atom selected from the group consisting of lower alkyl having from 1 to 3 carbon atoms, haloalkoxy having from 1 to 3 carbon atoms, hydroxyl, nitro and amino;
- a is a whole integer varying from 0 to 4;
- each B is a substituent on a cyclic alcohol ring selected from the group consisting of hydrogen, lower alkyl having from 1 to 3 carbon atoms, halo, alkoxy having from 1 to 3 carbon atoms, hydroxyl, nitro and amino;
- b is a whole integer varying between 0 and 6;
- x is the mole fraction of phenolic units and varies between 0.50 and 0.99;
- y is the mole fraction of cyclohexanol units and varies between 0.01 and 0.50, x' is the mole fraction of phenolic units having the inert blocking group and y' is the mole fraction of cyclohexanol units having the inert blocking group and each varies between 0.01 and 0.20;
- and --OG is a blocking group inert to reaction with acid or base, said combination of acid or base generator and crosslinking agent being present in an amount sufficient to crosslink said photoresist composition in areas exposed to activating radiation.
Dependencies are inferred from the claim text.