Photoactive compounds having a heterocyclic group used in photoresist compositions
AssigneeShipley Company, L.L.C.
InventorsAnthony Zampini, Ashish Pandya
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Abstract
A new photoactive compound for use in the formulation of a photoresist comprises a bisphenol compound having an alkyl linkage substituted with a heterocyclic group. The new photoactive compound may be admixed with an alkali soluble resin to formulate a photoresist composition. The new photoactive compounds exhibit enhanced long term solubility in conventional photoresist solvents.
Claims21
A photoresist composition comprising an alkali soluble resin and a sufficient amount of a light sensitive compound to form a latent image upon exposure to activating radiation, said light sensitive compound corresponding to the formula:
- ##STR11## whereby each Y is independently selected from the group consisting of hydrogen, lower alkyl, R'SO.sub.2, acyl, (R').sub.3 Si and a naphthoquinone diazide sulfonyl group where each R' is independently selected from the group of lower alkyl and aryl, provided that at least one of said Ys is the naphthoquinone diazide sulfonyl group;
- R is a member selected from the group consisting of hydrogen, lower alkyl, cyclic alkyl, aryl and a heterocyclic;
- R.sub.1, R.sub.2 and R.sub.3 are each independently selected form the group consisting of hydrogen, hydroxyl, lower alkyl, cyclic alkyl, aryl, alkoxy, alkenyl alkynyl, nitro, alkanoyl, carboxyl, sulfonyl and halogen;
- and Q is a heterocyclic group.
A photoresist composition comprising an alkali soluble resin and a sufficient amount of a light sensitive compound to form a latent image upon exposure to activating radiation, said light sensitive compound corresponding to the formula:
- ##STR12## where each Y is independently selected from the group consisting of hydrogen, lower alkyl, R'SO.sub.2, acyl, (R').sub.3 Si and a naphthoquinone diazide sulfonyl group where each R' is independently selected from the group of lower alkyl and aryl, provided that at least one of said Ys is the naphthoquinone diazide sulfonyl group;
- X is a member selected for the group consisting of oxygen and sulfur;
- R is a member selected from the group consisting of hydrogen, lower alkyl, cyclic alkyl, aryl and a heterocyclic;
- and R.sub.1, R.sub.2 and R.sub.3 are each independently selected form the group consisting of hydrogen, hydroxyl, lower alkyl, cyclic alkyl, aryl, alkoxy, alkenyl alkynyl, nitro, alkanoyl, carboxyl, sulfonyl and halogen;
- and R.sub.4 is selected from the group consisting of hydrogen, lower alkyl, alkoxy, alkenyl, alkynyl, carboxyl, alkoxy, carbonyl, nitro and halogen.
Dependencies are inferred from the claim text.