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US 5,512,500 AGranted
Method of fabricating semiconductor device
AssigneeKabushiki Kaisha Toshiba
InventorHisato Oyamatsu
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Abstract
A method of fabricating a semiconductor device forms a resist pattern for a gate electrode or the like on a semiconductor device in such a manner that only a fine resist pattern is formed on a resist member by an electron beam lithography and other resist patterns are formed on the same resist member by an optical lithography.
Claims4
A method of fabricating a semiconductor device comprises the steps of:
- forming a gate oxide film on a gate substrate;
- forming a polycrystalline silicon layer on said gate oxide film;
- forming an insulating film as an etching mask on said polycrystalline silicon layer;
- forming a first resist pattern on said insulating film by an electron beam lithography;
- selectively removing said insulating film with said first resist pattern used as a mask;
- forming a second resist pattern on said polycrystalline silicon layer, excluding a portion corresponding to said first resist pattern, by an optical lithography;
- and
- selectively removing said polycrystalline silicon layer with said insulating film and said second resist pattern used as a mask.
5 more elements
A method of fabricating a semiconductor device comprises the steps of:
- forming a gate oxide film on a gate substrate;
- forming a polycrystalline silicon layer on said gate oxide film;
- forming an insulating film as an etching mask on said polycrystalline silicon layer;
- forming a first resist pattern on said insulating film by an optical lithography;
- selectively removing said insulating film with said first resist pattern used as a mask;
- forming a second resist pattern on said polycrystalline silicon layer, excluding a portion corresponding to said first resist pattern, by an electron beam lithography;
- and
- selectively removing said polycrystalline silicon layer with said insulating film and said second resist pattern used as a mask.
5 more elements
Dependencies are inferred from the claim text.