Matarix resin for high-temperature stable photoimageable compositions
AssigneeHoechst Celanese Corporation
InventorsRalph R. Dammel, Owen B. Evans
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Abstract
The present invention relates to a novel matrix resin for high-temperature stable photoimageable compositions, in the form of a graft copolymer of monomeric or lower oligomeric hydroxyphenyl units grafted onto a polymer backbone containing reactive sites, to a process for its production and to its use as a matrix resin in photoimageable compositions either in a pure form or in admixture with other polymeric materials.
Claims8
A process for preparing a composition useful as a matrix resin in a photoimageable composition..consisting essentially of a parent polymer containing aromatic rings with reactive sites to Which graft groups of the general formula are attached by a covalent bond:
- ##STR15## wherein R.sub.1 to R.sub.4 are hydrogen, C.sub.1 to C.sub.4 alkyl, hydroxy or methylene aryl groups of the general formula:
- ##STR16## where R.sub.5 to R.sub.8 are hydrogen, C.sub.1 to C.sub.4 alkyl or hydroxy wherein the number of aromatic rings in the graft group is 1 to 4, wherein the process comprises mixing the parent polymer and the graft groups in a nucleophilic addition reaction under conditions conducive to the formation of a covalent chemical bond between the graft groups and the parent polymer.
A method of using a composition as a matrix resin in a photoimageable material, wherein the photoimageable material is applied to a substrate and the composition consists essentially of a parent polymer containing aromatic rings with reactive sites to which graft groups of the general formula are attached:
- ##STR18## where R.sub.1 to R.sub.4 are hydrogen, C.sub.1 to C.sub.4 alkyl, hydroxy or methylene aryl groups of the general formula:
- ##STR19## where R.sub.5 to R.sub.8 are hydrogen, C.sub.1 to C.sub.4 alkyl or hydroxy wherein the number of aromatic rings in the graft group is 1 to 4.
Dependencies are inferred from the claim text.