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US 5,509,967 AGranted
Heat treatment apparatus
AssigneeASM Japan K.K.
InventorsMitsusuke Kyogoku, Osamu Honma
Life of this patent
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Abstract
A reduction in the air tightness of a reaction chamber of an apparatus due to thermal degradation of a vacuum seal at the connection seal between the reaction chamber and a manifold is prevented. Contamination of the inside of the chamber from particles produced from heating members of the apparatus is reduced. The wall of the reaction chamber extends to a location sufficiently spaced from the lower end of the heater surrounding the reaction chamber. An exhaust port is provided in the wall to exhaust the reaction chamber.
Claims2
A heat treatment apparatus, which is part of low pressure CVD apparatus, comprising:
- a wall of a reaction chamber made of a high purity material such as quartz:
- a heater for heating said reaction chamber formed by said wall, said heater being positioned around said wall;
- a manifold connected to one open end of said wall;
- a flange configured to shield an opening of said manifold, the flange defining a vacuum chamber with said wall and said manifold;
- and
- an outlet provided on said wall between said heater and the open end of said wall for evacuating the inside of said reaction chamber.
3 more elements
Dependencies are inferred from the claim text.