Novolak containing photoresist stripper composition

A resist stripper composition comprising:

• (a) from about 20 to about 70% by weight of an organic polar solvent having a dipole moment of more than 3.5;
• (b) from about 70 to about 20% by weight of an amine compound selected from the group consisting of compounds having the formula (I):
• ##STR5## wherein n and m are each independently an integer ranging from 0-5, inclusive;
• X is hydrogen, alkyl, or alkoxy group;
• Y is either --O-- or --NH--;
• and Z is hydrogen, --OH, or --NH.sub.2 ;
• (c) about 0.01% to about 1% by weight of novolak resin having a weight average molecular weight (M.sub.w) from about 200 to about 5,000;
• (d) optionally from about 0 to about 10% by weight of an amino acid selected from the group consisting of compounds having the formula (II):
• ##STR6## wherein n is an integer ranging from 1-3;
• R.sup.1 and R.sup.2 are each independently selected from the group consisting of hydrogen and compounds having the formula ##STR7## wherein R.sup.5, R.sup.6, and R.sup.7 are each independently selected from hydrogen, --OH, --CH.sub.2 OH, alkyl, alkoxy, phenyl, and mono-, di- or tri-hydroxy-substituted phenyl groups;
• and R.sup.3 and R.sup.4 are each independently selected from the group consisting of hydroxy and compounds having the formula (IV):
• ##STR8## wherein X', Y', and Z' are each independently selected from hydrogen, --OH, --CH.sub.2 OH, --CH.sub.2 CH.sub.2 OH, --CH.sub.2 COOH, alkyl, or alkoxy group, and at least one of them is --OH, --CH.sub.2 CH.sub.2 OH, or --CH.sub.2 OH;
• and
• (e) optionally from about 0 to about 10% by weight of water.