System for detecting a latent image using an alignment apparatus
AssigneeInteruniversitair Micro-Elektronica Centrum vzw
InventorsRainer Pforr, Steve Wittekoek, Rolf Seltmann
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AssigneeInteruniversitair Micro-Elektronica Centrum vzw
InventorsRainer Pforr, Steve Wittekoek, Rolf Seltmann
Estimating the term…
The system comprises a latent image detection device comprising an alignment device which uses non-actinic radiation (10) and which is intended for aligning the mask pattern with respect to the substrate (3) and is designed for detecting the measure of coincidence of a mask alignment feature and a substrate alignment feature (8). The alignment device is provided with a radiation-sensitive detection system (6) which is connected to an electronic signal circuit in which the amplitude of the radiation incident on the detection system is determined, which originates from a latent image, formed in the photosensitive layer, of a mask feature, in which a spatial frequency occurs which is approximately equal to the useful resolving power of the projection lens system and considerably greater than the resolving power of the alignment device.
In an apparatus for forming an image, by means of projection radiation of a feature on a mask in a photosensitive layer on a substrate, is comprising a mask holder, a substrate holder in spaced relationship to said mask holder, projection lens means mounted between the mask holder and the substrate holder, and latent image detection means mounted in spaced relationship to said substrate holder for detecting an undeveloped image, formed by means of the projection light, of the mask feature in the photosensitive layer, wherein the latent-image detection device comprises alignment means including a source of non-actinic projection radiation for irradiating said substrate photosensitive layer, intended for aligning, via the projection lens system, the mask pattern with respect to the substrate and is designed for detecting the measure of coincidence of a mask alignment feature and a substrate alignment feature, which alignment device is nonactinic radiation-sensitive detection means and means for detecting the nonactinic radiation reflected from said substrate photosensitive layer and producing electrical signal indicative of the amplitude of the radiation incident on the nonactinic radiation-sensitive detection means reflected from an area of the photosensitive layer onto which there is projected an image of the mask feature,
A method of forming an image of a mask pattern in a photosensitive layer on a substrate, in which a mask having at least one mask feature is disposed above the photosensitive layer, comprising forming a latent image of the mask feature in the photosensitive layer by a projection lens means exposing a portion of the photosensitive layer to radiation having a first wavelength, moving the exposed portion of the photosensitive layer into the path of a beam of radiation of a second wavelength to which the photosensitive layer is insensitive, detecting the latent image of the mask feature in the photosensitive layer by means of a measuring means which produces a signal in response thereto, comparing an instantaneous value of an image parameter represented by the signal produced by the measuring means in response to the detection of the latent image of the mask feature with a desired value of said parameter, setting the image parameter, and forming an image of the mask pattern on at least one position in the photosensitive layer,
Dependencies are inferred from the claim text.