Etching compositions
AssigneeMicro-Image Technology Limited
InventorDavid S. Maternaghan
Life of this patent
Estimating the term…
Abstract
An aqueous composition for etching and cleaning semiconductor devices comprises a solution of an acid and a surfactant which is a branched chain aliphatic amine having the formula C.sub.m H.sub.2m+3 N, where m is an integer from 7 to 10. The compositions are stable for long periods of time and do not suffer foaming problems when used in recirculation filtration systems.
Claims14
An aqueous composition for etching and cleaning semiconductor devices comprising at least one acid and a surfactant, characterised in that the composition comprises from 100 ppm to 2000 ppm of a surfactant which is a branched chain aliphatic amine having the formula C.sub.m H.sub.2m+3 N, where m is an integer from 7 to 10.
A method of making an aqueous acidic etchant composition that does not suffer from significant foaming, the method comprising, using a branched chain aliphatic amine having the formula C.sub.m H.sub.2m+3 N, wherein m is an integer from 7 to 10, as a surfactant in said aqueous acid etchant composition.
Dependencies are inferred from the claim text.