Structure to protect against below ground current injection
AssigneeSGS-Thomson Microelectronics S.A.
InventorAthos Canclini
Life of this patent
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AssigneeSGS-Thomson Microelectronics S.A.
InventorAthos Canclini
Estimating the term…
An isolation structure is provided to give improved protection from below ground current injection. A first epitaxial region is provided between a power field effect device and nearby control circuitry. The first epitaxial region is tied to the substrate, and the ties are located between the first epitaxial region and the power field effect device. On the opposite side of the power device, preferably adjacent an edge of the integrated circuit chip, a second epitaxial region is formed. This epitaxial region is connected to the first epitaxial region, preferably by a metal interconnect line. A second set of substrate contacts is located between the power device and the second epitaxial region, and is tied to ground. The second epitaxial region encourages injection of current at a location spaced away from the control circuitry.
A protective structure for an integrated circuit having a power transistor integrated on a single chip with control devices, comprising:
A protective structure for an integrated circuit having a power transistor integrated on a single chip with control devices, comprising:
A protective structure for an integrated circuit having a power transistor integrated on a single chip with control devices, comprising:
Dependencies are inferred from the claim text.