Radiation sensitive resin composition
AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsShinji Shiraki, Hidetoshi Miyamoto, Masaaki Inoue, Toshiyuki Ota, Yoshiji Yumoto, Takao Miura
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Abstract
A radiation sensitive resin composition which can be suitably used as a negative type resist having a high sensitivity, a high resolution, a high yield of residual film thickness and high thermal resistance, and which comprises (A) an alkali-soluble novolak resin, (B) a phenolic compound having a standard polystyrene-reduced weight average molecular weight of 10,000 or less such as polyvinylphenol, (C) a compound capable of cross-linking the component (A) and/or the component (B) in the presence of an acid, and (D) a radiation sensitive acid generator such as a triazine compound having a halomethyl group.
Claims18
A radiation sensitive resin composition which comprises:
- (A) an alkali-soluble novolak resin,
- (B) a phenolic compound other than (A) having a standard polystyrene-reduced weight average molecular weight of 10,000 or less as measured by a gel permeation chromatography,
- (C) a compound capable of cross-linking the components (A) and (B) in the presence of an acid, and
- (D) a radiation sensitive acid generator represented by formula (I):
- ##STR12## wherein R.sup.01 represents a trihalomethyl group, a substituted or unsubstituted phenyl group or a substituted or unsubstituted naphthyl group, and X's may be the same as or different from one another and each represents a halogen atom, by formula (II):
- ##STR13## wherein X's may be the same as or different from one another and each represents a halogen atom, Y represents ##STR14## and R.sup.02 represents a hydrogen atom, an alkyl group, a hydroxyl group or an alkoxy group, and m represents an integer of 1 to 5, provided that when m is 2 or more, the plural R.sup.02 groups may be the same as or different from one another, or by formula (III):
- ##STR15## wherein R.sup.03 represents a hydrogen atom, an alkyl group, a hydroxyl group or an alkoxy group, X's may be the same as or different from one another and each represents a halogen atom and q represents an integer of 1 to 3, provided that when q is 2 or 3 the plural R.sup.03 groups may be the same as or different from one another.
Dependencies are inferred from the claim text.