US 5,492,846 A · Fabrication method of nonvolatile semiconductor memory device

Abstract

A fabrication method of a split-gate type flash EEPROM with an improved data-storage characteristic. Insulator strips extending along a first direction are formed on a semiconductor substrate at intervals. The strips are in contact with active regions and a field insulator film. After a first gate insulator film is formed on uncovered parts of the active regions, respectively, a first patterned conductor film is formed to cover the insulator strips and the first gate insulator film. The first conductor film is anisotropically etched to produce floating gate electrodes lower in height than the stripes on the first gate insulator film without using a mask. Each of the floating gate electrodes has an oblique side face. A second gate insulator film is formed to cover the floating gate electrodes and exposed parts of the active regions. A second conductor film is formed to cover the second gate insulator film and the insulator strips. The second conductor film is etched back to flatten a surface of the second conductor film until tops of the strips are exposed. The second conductor film is patterned to produce control gate electrodes. After the insulator strips are removed, drain regions and source regions are formed in the active regions respectively.

Claims19

Dependent claims

In a fabrication method of a flash electrically erasable programmable read-only memory device with the split-gate type memory cells, said method comprising the steps of:

forming a first gate insulator film on a semiconductor substrate;
forming a first conductor film on said first gate insulator film;
anisotropically etching said first conductor film to produce floating gate electrodes without using a mask and to expose a portion of said substrate, each of said floating gate electrodes having at least one oblique or curved side face;
forming a second gate insulator film to cover said floating gate electrodes and said exposed portion of said substrate;
forming a second conductor film on said second gate insulator film;
and
patterning said second conductor film to produce control gate electrodes;
wherein
electric field concentration is restrained in said floating gate electrodes due to said at least one oblique or curved side face of said first conductor film, and gate lengths of said floating gate electrodes are substantially equal.

6 more elements

A fabrication method of a flash electrically erasable programmable read-only memory device with the split-gate type memory cells, said method comprising the steps of:

(a) forming a patterned field insulator film on a semiconductor substrate to produce active regions at said substrate and uncovered parts of said substrate, said active regions being arranged at intervals in a first direction and a second direction perpendicular to said first direction;
(b) forming insulator strips extending along said first direction on said substrate at intervals, said strips being in contact with said active regions and said field insulator film;
(c) selectively forming a first gate insulator film on uncovered parts of said substrate, respectively;
(d) forming a first patterned conductor film to cover said insulator strips and said first gate insulator film;
(e) anisotropically etching said first conductor film to produce floating gate electrodes lower in height than said strips on said first gate insulator film without using a mask, each of said floating gate electrodes being adjacent to corresponding one of said strips, and having at least one oblique or curved side face at an opposite end to said corresponding one of said strips;
(f) selectively removing said first gate insulator film except for parts underlying said floating gate electrodes;
(g) forming a second gate insulator film to cover said floating gate electrodes and exposed parts of said active regions;
(h) forming a second insulator film to cover said second gate insulator film and said insulator strips, said second conductor film being etched back to flatten a surface of said second conductor film until tops of said strips are exposed from said second conductor film;
(i) patterning said second conductor film to produce control gate electrodes;
(j) forming drain regions and source regions in said active regions, respectively after the insulator strips are removed;
(k) forming an interlayer insulator film to cover all over said substrate and bit contact holes in said interlayer insulator film;
and
(l) forming bit lines extending along said second direction on said interlayer insulator film, said bit lines being arranged at interval and being in contact with corresponding ones of said drain regions.

10 more elements

A fabrication method of a flash electrically erasable programmable read-only memory device with the split-gate type memory cells, said method comprising the steps of:

(a) forming a patterned field insulator film on a semiconductor substrate to produce active regions at said substrate and uncovered parts of said substrate, said active regions being arranged at intervals in a first direction and a second direction perpendicular to said first direction;
(b) forming insulator strips extending along said first direction on said substrate at intervals, said strips being in contact with said active regions and said field insulator film;
(c) selectively forming a first gate insulator film on uncovered parts of said substrate, respectively;
(d) forming a first patterned conductor film to cover said insulator strips and said first gate insulator film;
(e) anisotropically etching said first conductor film to produce floating gate electrodes lower in height than said strips on said first gate insulator film without using a mask, each of said floating gate electrodes being adjacent to corresponding one of said strips, and having an oblique side face at opposite end to said corresponding one of said strips;
(f) selectively removing said first gate insulator film except for parts underlying said floating gate electrodes;
(g) forming a second gate insulator film to cover said floating gate electrodes and exposed parts of said active regions;
(h) forming a second insulator film to cover said second gate insulator film and said insulator strips, said second conductor film being selectively etched to produce control gate electrodes;
(i) forming drain regions and source regions in said active regions, respectively after said insulator strips are removed;
(j) forming an interlayer insulator film to cover all over said substrate and bit contact holes in said interlayer insulator film;
and
(k) forming bit lines extending along said second direction on said interlayer insulator film, said bit lines being arranged at intervals and being in contact with corresponding ones of said drain regions.

9 more elements

In a fabrication method of a flash electrically erasable programmable read-only memory device with the split-gate type memory cells, said method comprising the steps of:

forming a first gate insulator film on a semiconductor substrate;
forming a first conductor film on said first gate insulator film;
patterning said first conductor film to produce floating gate electrodes without using a mask and to expose a portion of said substrate, each of said floating gate electrodes having at least one oblique or curved side face;
forming a second gate insulator film to cover said floating gate electrodes and said exposed portion of said substrate;
forming a second conductor film on said second gate insulator film;
and
patterning said second conductor film to produce control gate electrodes;
forming drain regions and source regions in said substrate in self-alignment to said control gate electrodes, respectively, each of said source regions being formed in self-alignment to said control gate electrodes which correspond to different drain regions, respectively,
wherein
electric field concentration is restrained in said floating gate electrodes due to said at least one oblique or curved side face of said first conductor film, and gate lengths of said floating gate electrodes are substantially equal, and each of said drain regions are commonly used by adjacent memory cells.

7 more elements

A fabrication method of a flash electrically erasable programmable read-only memory device with the split-gate type memory cells, said method comprising the steps of:

(a) forming a patterned field insulator film on a semiconductor substrate to produce active regions at said substrate and uncovered parts of said substrate, said active regions being arranged at intervals in a first direction and a second direction perpendicular to said first direction;
(b) forming insulator strips extending along said first direction on said substrate at intervals, said strips being in contact with said active regions and said field insulator film;
(c) selectively forming a first gate insulator film on uncovered parts of said substrate, respectively;
(d) forming a first patterned conductor film to cover said insulator strips and said first gate insulator film;
(e) anisotropically etching said first conductor film to produce floating gate electrodes lower in height than the strips on said first gate insulator film without using a mask, each of said floating gate electrodes being adjacent to corresponding one of said strips, and having an oblique side face at an opposite end to said corresponding one of said strips;
(f) selectively removing said first gate insulator film except for parts underlying said floating gate electrodes;
(g) forming a second gate insulator film to cover said floating gate electrodes and exposed parts of said active regions;
(h) forming a second conductor film to cover said second gate insulator film and said insulator strips, said second conductor film is selectively etched to produce control gate electrodes;
(i) selectively etching exposed part of said field oxide film
(j) forming drain regions and source regions in said active regions in self-alignment to said control gate electrodes, respectively, each of said source regions being formed in self-alignment to said control gate electrodes which belong to different ones of said drain regions, respectively;
(k) forming an interlayer insulator film to cover all of said substrate and forming bit contact holes in said interlayer insulator film;
and
(l) forming bit lines extending along said second direction on said interlayer insulator film, said bit lines being arranged at intervals and in contact with corresponding ones of said drain regions.

10 more elements

Dependencies are inferred from the claim text.

Fabrication method of nonvolatile semiconductor memory device

Life of this patent

Fabrication method of nonvolatile semiconductor memory device

Life of this patent

Abstract

Claims19