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AssigneeInstitut National Polytechnique de Lorraine
InventorsBruno Stauder, Frederic Perry, Claude Frantz, Alain Billard, Philippe Pigeat, Gerard Henrion
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Method for self-stabilizing deposition of a stoichiometric compound by reactive sputtering using a cold plasma. A reactive gas is supplied to a target, the instantaneous power applied to the target is cyclically reduced and increased at a frequency sufficiently low that a reaction between the target material and the reactive gas takes place on the surface of the target, and the product of the reaction is then sputtered off the surface of the target and onto a substrate. The alternating decrease and increase of the instantaneous power applied to the target at low frequency provides for self-stabilizing deposition of the reaction product on the substrate.
A method for sputtering a reaction product of a target material and a reactive gas on a substrate by means of a cold plasma used for sputtering the target, said method comprising the steps of:
A method of reactive magnetron sputtering for coating a substrate with a reaction product produced by a metallic or semi-conductive target that is sputtered by plasma discharge in the presence of reactive gas, said method comprising the steps of:
Dependencies are inferred from the claim text.