Exposure apparatus and microdevice manufacturing method using the same
AssigneeCanon Kabushiki Kaisha
InventorTakahisa Shiozawa
Life of this patent
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Abstract
An exposure apparatus for exposing a substrate with pulses of light supplied sequentially, is disclosed. The apparatus includes a detector for detecting the light quantity of each pulse, and a controller for controlling the timing of exposure of the substrate with a pulse to be emitted, on the basis of the light quantity provided by at least one pulse preceding the pulse to be emitted.
Claims33
An exposure apparatus for exposing a substrate with pulses of light supplied sequentially, said apparatus comprising:
- means for detecting the light quantity of a pulse;
- and
- means for controlling the timing of emission of a pulse to be emitted, on the basis of the light quantity provided by at least one pulse preceding the pulse to be emitted.
A device manufacturing method in which a workpiece is exposed with pulses of light supplied sequentially, said method comprising the steps of:
- detecting the light quantity of at least one pulse emitted;
- and
- controlling the timing of emission of a pulse to be emitted, on the basis of the detected light quantity.
A scanning exposure apparatus for exposing a substrate with light pulses emitted sequentially, said apparatus comprising:
- scanning means for scanningly moving the substrate relative to light pulses;
- detecting means for detecting the light quantity of light pulses;
- and
- control means, operable on the basis of (i) the light quantity of at least one emitted light pulse, being emitted before emission of a subsequent light pulse, (ii) a reference light quantity preset for each light pulse and (iii) a reference period preset for each light pulse, for determining the period for the subsequent light pulse, and for controlling the timing of emission of the subsequent pulse light in accordance with the determination.
A scanning exposure apparatus for exposing a substrate with light pulses emitted sequentially, said apparatus comprising:
- scanning means for scanningly moving the substrate relative to light pulses;
- detecting means for detecting the light quantity of light pulses;
- and
- control means, operable on the basis of (i) the light quantity of at least one emitted light pulse, being emitted before emission of a subsequent light pulse, (ii) a reference light quantity being preset for each light pulse and (iii) a reference position of the substrate being preset in relation to each pulse to be emitted, for determining the position of the substrate to be taken in relation to the subsequent light pulse, and for controlling the timing of emission of the subsequent pulse light in accordance with the determination.
A scanning exposure apparatus for exposing a substrate with light pulses emitted sequentially, said apparatus comprising:
- scanning means for scanningly moving the substrate relative to light pulses;
- and
- light pulse supplying means for supplying light pulses each having a sectional intensity distribution, in a scanning direction, of approximately trapezoidal shape, and wherein the length in the scanning direction of a region, corresponding to the bottom of the trapezoidal shape, is substantially equal to the product of multiplying a movement distance of the substrate per one light pulse by a natural number.
Dependencies are inferred from the claim text.