Heating units for use in semiconductor-producing apparatuses and production thereof
AssigneeNGK Insulators, Ltd.
InventorsTakao Soma, Ryusuke Ushikoshi, Kazuhiro Nobori
Life of this patent
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Abstract
A wafer heater for use in a semiconductor producing apparatus or the like. The heater includes a discoidal substrate made of a dense ceramic, and a resistance heating element buried in the substrate. The surface of the substrate other than that surface upon which a wafer is to be placed for heating is a flat surface. The heating unit further includes a hollow sheath of which inner pressure is not substantially varied even when the pressure inside the chamber changes and is partially embedded and joined to the heater, and a thermocouple inserted into the hollow sheath.
Claims3
A heating unit for use in a semiconductor producing apparatus, said heating unit comprising:
- a chamber, the inner pressure of which varies;
- a heater comprising a discoidal substrate made of a dense ceramic and a resistance heating element buried in said substrate;
- a hollow sheath, the inner pressure of which is not substantially varied even when the pressure of said chamber changes, said hollow sheath being partially embedded in and joined to said heater substrate in a gas-tight state;
- and
- a thermocouple inserted into said hollow sheath.
Dependencies are inferred from the claim text.