Gas handling device assembly used for a CVD apparatus

A gas supplying apparatus supplying a gas to an external device, the gas supplying apparatus comprising:

• a base plate having a top surface and a bottom surface opposite to said top surface, a plurality of through holes extending from said top surface to said bottom surface being formed in said base plate so that the gas flows through said through holes;
• a stop valve having a mount surface via which said stop valve is fixed to said base plate, an inlet port and an outlet port for the gas being formed on said mount surface so that each of said inlet port and said outlet port is connected to one of through holes of said base plate;
• a pressure controlling valve having a mount surface via which said pressure controlling valve is fixed to said base plate, an inlet port and an outlet port for the gas being formed on said mount surface so that each of said inlet port and said outlet port is connected to one of through holes of said base plate;
• a flow controller having a mount surface via which said flow controller is fixed to said base plate, an inlet port and an outlet port for the gas being formed on said mount surface so that each of said inlet port and said outlet port is connected to one of through holes of said base plate;
• and
• a plurality of connecting tubes each having a first connecting member on one end and a second connecting member on the other end, said first connecting member and said second connecting member facing toward the same direction,
• wherein said stop valve, said pressure controlling valve and said flow controller are fixed to said top surface of said base plate, and said connecting tubes are fixed to said bottom surface of said base plate so that said stop valve, said pressure controlling valve, said flow controller, said connecting tube and said through holes together form a gas-flow circuit.

A chemical vapor deposition apparatus comprising:

• a gas cylinder for supplying a process gas;
• a reaction chamber into which the process gas is introduced for performing a chemical vapor deposition;
• and
• a gas supplying apparatus supplying a gas to an external device,
• wherein said gas supplying apparatus comprising:
• a base plate having a top surface and a bottom surface opposite to said top surface, a plurality of through holes extending from said top surface to said bottom surface being formed in said base plate so that the gas flows through said through holes;
• a stop valve having a mount surface via which said stop valve is fixed to said base plate, an inlet port and an outlet port for the gas being formed on said mount surface so that each of said inlet port and said outlet port is connected to one of said through holes of said base plate;
• a pressure controlling valve having a mount surface via which said pressure controlling valve is fixed to said base plate, an inlet port and an outlet port for the gas being formed on said mount surface so that each of said inlet port and said outlet port is connected to one of said through holes of said base plate;
• a flow controller having a mount surface via which said flow controller is fixed to said base plate, an inlet port and an outlet port for the gas being formed on said mount surface so that each of said inlet port and said outlet port is connected to one of said through holes of said base plate;
• and
• a plurality of connecting tubes each having a first connecting member on one end and a second connecting member on the other end, said first connecting member and said second connecting member facing toward the same direction,
• wherein said stop valve, said pressure controlling valve and said flow controller are fixed to said top surface of said base plate, and said connecting tubes are fixed to said bottom surface of said base plate so that said stop valve, said pressure controlling valve, said flow controller, said connecting tube and said through holes together form a gas-flow circuit.