Four layer overvoltage protection device having buried regions aligned with shorting dots to increase the accuracy of overshoot voltage value
AssigneeTeccor Electronics, Inc.
InventorsMonty F. Webb, Elmer L. Turner
Life of this patent
Estimating the term…
Abstract
An overvoltage protection device having multiple shorting dots in the emitter region and multiple buried regions substantially aligned with these shorting dots. The placement, number, and area of these buried regions reduce and more accurately set the overshoot voltage value of the device while maintaining the high surge capacities of the device. Further, doping types and concentrations have been modified from that known in the prior art to reduce overshoot providing a more accurate and sensitive overvoltage protection device than that known previously in the prior art.
Claims46
A multiple layer overvoltage protection device comprising:
- a first and a second metal contact;
- an upper base region layer having a first type of conductivity coupled to said first metal contact;
- a plurality of shorting dot regions located in said upper base region layer and having a contiguous relation to said first metal contact;
- at least one emitter region having a second type of conductivity located in said upper base region layer and between at least two of said shorting dot regions in said upper base region;
- a mid-region layer having the same type of conductivity as said emitter region and being coupled to said upper base region layer;
- a plurality of discrete buried regions located in said mid-region layer having contiguous relation with said upper base region and being of the same type of conductivity as said mid-region layer wherein more than one of said buried regions is substantially vertically aligned with more than one of said shorting dot regions in said upper base region;
- a lower base region layer having the same type of conductivity as said upper base region layer and coupled to said mid-region layer and said second metal contact.
A bidirectional multiple layer overvoltage protection device activated by either a positive or negative voltage surge comprising:
- a first and a second metal contact;
- at least one upper base region layer having a first type of conductivity coupled to one of said metal contacts;
- a plurality of shorting dot regions located in at least one of said upper base region layers and having a contiguous relation to said one of said metal contacts;
- at least one emitter region having a second type of conductivity located in at least one of said upper base region layers and between at least two of said shorting dot regions in said upper base region;
- a mid-region layer having the same type of conductivity as said emitter region and being coupled to at least one of said upper base region layers;
- a plurality of discrete buried regions located in said mid-region layer being of the same type of conductivity as said mid-region layer wherein more than one of said buried regions is in contiguous relation with one of said upper base regions and is substantially vertically aligned with more than one of said shorting dot regions;
- at least one lower base region layer having the same type of conductivity as one of said upper base region layers and coupled to said mid-region layer and one of said metal contacts.
A multiple layer overvoltage protection device comprising:
- a first and a second metal contact;
- an upper base region layer having a first type of conductivity coupled to said first metal contact;
- at least one shorting dot region located in said upper base region layer and having a contiguous relation to said first metal contact;
- at least one emitter region having a second type of conductivity located in said upper base region layer and adjacent to said shorting dot region in said upper base region;
- a mid-region layer having the same type of conductivity as said emitter region and being coupled to said upper base region layer;
- at least two discrete buried regions located in said mid-region layer having contiguous relation with said upper base region mid being of the same type of conductivity as said mid-region layer and each of said buried regions underlying any amount of the area vertically aligned under each of said shorting dot regions;
- a lower base region layer having the same type of conductivity as said upper base region layer and being coupled to said mid-region layer and said second metal contact.
A multiple layer overvoltage protection device comprising:
- a first and a second metal contact;
- an upper base region layer having a first type conductivity coupled to said first metal contact;
- at least two shorting dot regions located in said upper base region layer and having a contiguous relation to said first metal contact;
- at least one emitter region having a second type of conductivity located in said upper base region layer and between said at least two shorting dot regions in said upper base region;
- a mid-region layer having the same type of conductivity as said emitter region and being coupled to said upper base region layer;
- a plurality of discrete buried regions located in said mid-region layer and having a contiguous relation with said upper base region and being of the same conductivity as said mid-region layer, wherein at least one of said discrete buried regions is substantially vertically aligned with one of said shorting dot regions;
- a lower base region layer having the same type of conductivity as said upper base region layer and coupled to said mid-region layer and said second metal contact;
- and
- a first getter region having the same type of conductivity at a higher doping concentration as said upper base region layer in said lower base region layer.
A bidirectional multiple layer overvoltage protection device activated by either a positive or negative voltage surge comprising:
- a first and a second metal contact;
- at least one upper base region layer having a first type conductivity coupled to one of said metal contacts;
- at least one shorting dot region located in one said upper base region layers and having a contiguous relation to said first metal contact;
- at least one emitter region having a second type of conductivity located in at least one of said upper base region layers and adjacent to said at least one shorting dot regions in one said upper base region layers;
- a mid-region layer having the same type of conductivity as said emitter region and being coupled to at least one of said upper base region layers;
- a plurality of discrete buried regions located in said mid-region layer having a contiguous relation with one of said upper base region layers and being of the same type of conductivity as said id-region layer, wherein at least one of said discrete buried regions is substantially vertically aligned with one of said shorting dot regions;
- at least one lower base region layer having the same type of conductivity as one of said upper base region layers and coupled to said mid-region layer and one of said metal contacts;
- and
- a first getter region having the same conductivity at a higher doping concentration as said lower base region in one of said lower base region layers.
Dependencies are inferred from the claim text.