US 5,478,691 A · Radiation-sensitive resin composition

Abstract

A radiation-sensitive resin composition comprising an alkali-soluble novolak resin and a 1,2-quinonediazide compound, wherein the alakli-soluble novolak resin comprises a mixture of: 95-50 parts by weight of Resin A having a standard polystyrene-reduced weight-average molecular weight of 2,000-20,000 [Resin A is at least one resin selected from the group consisting of a resin obtained by polycondensation of m-cresol and at least one phenol represented by the structural formula (I) or (I'): ##STR1## wherein m is 2 or 3, with at least one aldehyde and a resin obtained by polycondensation of m-cresol, p-cresol and at least one phenol repreented by the above structural formula (I) or (I') with at least one aldehyde] and 5-50 parts by weight of Resin B having a standard polystyrene-reduced weight-average molecular weight of 200-2,000 [Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II): ##STR2## wherein n is 0, 1, 2 or 3, with at least one aldehyde]. In the resin composition, the mixture of Resin A and Resin B may further contain Resin C which is an ester of Resin B with a 1,2-quinonediazidesulfonic acid. The radiation-sensitive resin compopsition is suitable for use as a positive type resist having high sensitivity, excellent developability, high resolution and excellent heat resistance.

Claims17

Dependent claims

A radiation sensitive resin composition consisting of (1) an alkali-soluble novolak resin, (2) a 1,2-quinonediazide compound and (3) a solvent, wherein the alkali-soluble novolak resin consists of a mixture of:

50-95 parts by weight of Resin A having a standard, polystyrene-reduced weight-average molecular weight of 2,000-20,000, wherein Resin A is (i) a resin obtained by polycondensation of phenolic ingredients consisting of m-cresol phenol represented by structural formula (I) or (I'):
##STR8## wherein m is 2 or 3, with at least one aldehyde, (ii) a resin obtained by polycondensation of phenolic ingredients consisting of m-cresol, p-cresol and at least one phenol represented by structural formula (I) or (I') with at least one aldehyde, or (iii) a combination of resins (i) and (ii), and
- 45parts by weight of Resin B having a standard, polystyrene-reduced weight-average molecular weight of 200-2,000, wherein Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II):
##STR9## wherein n is 0, 1, 2 or 3, with at least one aldehyde, and - 50parts by weight of Resin C, wherein Resin C is an ester of Resin B with 1,2-quinonediazidesulfonic acid.

1 more element

A radiation-sensitive resin composition consisting of (1) an alkali-soluble novolak resin, (2) a 1,2-quinonediazide compound, (3) a solvent and (4) at least one of a sensitizer, a surface active agent, a dye, a storage stability improver, a pigment and an antifoaming agent, wherein the alkali-soluble novolak resin consists of a mixture of:

0-95 parts by weight of Resin A having a standard, polystyrene-reduced weight-average molecular weight of 2,000-20,000, wherein Resin A is (i) a resin obtained by polycondensation of phenolic ingredients consisting of m-cresol and at least one phenol represented by structural formula (I) or (I'):
##STR11## wherein m is 2 or 3, with at least one aldehyde, (ii) a resin obtained by polycondensation of phenolic ingredients consisting of m-cresol, p-cresol and at least one phenol represented by formula (I) or (I') with at least one aldehyde, or (iii) a combination of resins (i) and (ii), and
- 45parts by weight of Resin B having a standard, polystyrene-reduced weight-average molecular weight of 200-2,000, wherein Resin B is a resin obtained by polycondensation of at least one phenol represented by the structural formula (II):
R1 ? ? ##STR12## wherein n is 0, 1, 2 or 3, with at least one aldehyde, and - 50parts by weight of Resin C, wherein Resin C is an ester of Resin B with 1,2-quinonediazidesulfonic acid.

1 more element

Dependencies are inferred from the claim text.

Radiation-sensitive resin composition

Life of this patent

Radiation-sensitive resin composition

Life of this patent

Abstract

Claims17