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US 5,478,681 AGranted
Method for producing color filter
AssigneeNippon Oil Co., Ltd.
InventorsYukio Yamasita, Haruyoshi Sato, Toru Nakamura, Hitoshi Yuasa, Yutaka Otsuki
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Abstract
A method for producing a color filter comprising exposing a portion of the color filter corresponding to colored portions through a different pattern mask by colors and in an irradiation dose varying for each mask to effect patterning and successively coloring the pattern portions smaller or larger in the order of light irradiation dose by way of development and electrodeposition.
Claims40
A method for producing a color filter comprising the steps of:
- (A) forming a negative photoresist film on a transparent substrate having a transparent electrically conductive layer on the surface thereof and exposing the film separately through at least two negative pattern masks in such manner that a different light irradiation dose is supplied to the photoresist through each pattern mask, to thereby form at least two pattern regions and
- (B) performing an operation of developing the photoresist film and of applying a liquid colored coating by electrodeposition onto the electrically conductive layer to form a colored layer followed by repeating said operation successively for the respective pattern regions in the order in which the light irradiation dose increases.
A method for producing a color filter comprising the steps of:
- (A') forming a positive photoresist film on a transparent substrate having a transparent electrically conductive layer on the surface thereof and exposing the film separately through at least two positive pattern masks in such manner that a different light irradiation dose is supplied to the photoresist through each pattern mask, to thereby form at least two pattern regions and
- (B') performing an operation of developing the photoresist film and of applying a liquid colored coating by electrodeposition onto the electrically conductive layer to form a colored layer followed by repeating said operation successively for the respective pattern regions in the order in which the light irradiation dose decreases.
Dependencies are inferred from the claim text.