Semiconductor structure using local planarization with self-aligned transistors
AssigneeParadigm Technology, Inc.
InventorTing-Pwu Yen
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AssigneeParadigm Technology, Inc.
InventorTing-Pwu Yen
Estimating the term…
A CMOS integrated circuit uses self-aligned transistors combined with local planarization in the vicinity of the transistors so as allow local interconnects which are free of bridging, have good continuity over the planarized topography and are compatible with the self-alignment schemes, hence conserving chip real estate. After formation of self-aligned insulated transistor gates and active transistor regions, the integrated circuit structure is planarized by formation of an oxide layer and a reflowed overlying glass layer. The glass layer and underlying oxide layer are removed only in the area of the buried contact, while an overlying metal or polysilicon conductive layer contacts the upper surface of certain of the transistor gate structures, the topside insulating layer of which has been removed for this purpose.
An integrated circuit formed on a substrate having a principal surface, comprising:
An integrated circuit structure formed on a substrate having a principal surface, comprising:
Dependencies are inferred from the claim text.