Drive transistor for CCD-type image sensor
AssigneeSamsung Electronics Co., Ltd.
InventorJung-hyun Nam
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Abstract
A charge-coupled device type image sensor having a floating diffusion-type amplifier including a drive transistor comprising a substrate, a drain region, a source region, a depletion channel region formed between the drain and source regions in contact with the drain region, and a gate electrode formed on the substrate between the source region and the drain region, such that the gate electrode overlays a portion of the source region and overlays a portion of the depletion channel region, wherein the drain region is spaced apart from said gate electrode.
Claims6
A charge-coupled device type image sensor including a drive transistor comprising:
- a substrate of first conductivity type;
- a drain region of second conductivity type formed in a surface of said substrate;
- a source region of second conductivity type formed in said surface of said substrate spaced apart from said drain region;
- a depletion channel region of second conductivity type formed in said surface of said substrate between said drain region and said source region in contact with said drain region;
- a first gate electrode formed over said surface of said substrate between said source region and said drain region and overlaying a portion of said source region;
- and
- a second gate electrode, physically separate from said first gate electrode and electrically connected to said first electrode, formed over said surface of said substrate between said source region and said drain region and overlaying a portion of said depletion channel region.
A charge-coupled device type image sensor including a drive transistor comprising:
- a substrate of first conductivity type;
- a drain region of second conductivity type formed in a surface of said substrate;
- a source region of second conductivity type formed in said surface of said substrate and spaced apart from said drain region;
- a buried drain region of second conductivity type having an impurity density less than the impurity density of said drain region formed below said surface of said substrate between said source region and said drain region in contact with said drain region;
- a surface depletion layer of first conductivity type, having an impurity concentration greater than said substrate, formed in said surface of said substrate between said drain region and said source region overlaying a portion of said buried drain region
- a gate electrode electrically formed over said substrate between said source region and said drain region such that said gate electrode overlays a portion of said source region and overlays a portion of said buried drain region.
Dependencies are inferred from the claim text.