Semiconductor light exposure device

A semiconductor exposure device comprising

• light beam generating means for illuminating a reticle having a semiconductor circuit pattern formed thereon, said light beam generating means including a light source for excitation, a first resonator and a second resonator, said first resonator being illuminated with a light beam from said light source for excitation and wavelength-converting the light beam from said light source for excitation for outputting a first light beam, said second resonator being illuminated with the first light beam from said first resonator and wavelength-converting the first light beam for outputting a second light beam,
• an image-forming optical system for radiating said second light beam from said light beam generating means on said reticle for generating an illuminated light image on said wafer,
• movement means for moving said wafer relative to said image-forming optical system, and
• alignment means for detecting the position relative to said wafer of the image formed on said wafer by said image-forming optical system on the basis of a return beam from the wafer of said first light beam for position matching the image formed by said image-forming optical system with respect to the wafer.

A semiconductor exposure device comprising

• light beam generating means for illuminating a reticle having a semiconductor circuit pattern formed thereon, said light beam generating means including a light source for excitation, a first resonator and a second resonator, said first resonator being illuminated with a light beam from said light source for excitation and wavelength-converting and outputting the light beam from said light source for excitation, said second resonator being illuminated with the light beam from said first resonator and wavelength-converting and outputting the light beam from said first resonator,
• an image-forming optical system for forming on a wafer an illuminated light image produced on illuminating said reticle with the light beam from said light beam generating means,
• movement means for moving said wafer relative to said image-forming optical system, and
• alignment means for radiating a light beam offset from the optical axis of the light beam illuminated from the light beam generating means by said image-forming means on the wafer for detecting the position relative to the wafer of the image formed on said wafer by said image-forming optical system for position matching the image formed by said image-forming optical system with respect to the wafer.

A semiconductor exposure device comprising

• light beam generating means for illuminating a reticle having a semiconductor circuit pattern formed thereon, said light beam generating means including a light source for excitation for radiating a light beam having a wavelength of 810 nm, a first resonator and a second resonator, said first resonator including a laser medium illuminated by a light beam of a wavelength of 810 nm from said light source for excitation and a first non-linear optical crystal device illuminated by the light beam of a wavelength of 1064 nm from said light medium for excitation for outputting a light beam of a wavelength of 532 nm, said second resonator including a second non-linear optical crystal element illuminated by the light beam of a wavelength of 532 nm from said first resonator for outputting a light beam of a wavelength of 266 nm,
• an image-forming optical system for radiating said light beam of the wavelength of 266 nm from said light beam generating means on said reticle for generating a light image on said wafer,
• movement means for moving said wafer relative to said image-forming optical system, and
• alignment means for detecting the position relative to said wafer of the image formed on said wafer by said image-forming optical system for position matching the image formed by said image-forming optical system with respect to the wafer.