Non-corrosion photoresist stripping composition

A resist stripper composition comprising:

• (a) from about 85 to about 10% by weight of an organic polar solvent having a dipole moment of more than 3.5;
• (b) from about 10 to about 40% by weight of an amine compound selected from the group consisting of compounds having the formula (I):
• ##STR5## wherein n and m are each independently an integer ranging from 1-5, inclusive;
• X is hydrogen, alkyl, or alkoxy group;
• Y is either --O-- or --NH--;
• and Z is hydrogen, --OH, or --NH.sub.2 ;
• (c) from about 5 to about 30% by weight of an amino acid selected from the group consisting of compounds having the formula (II):
• ##STR6## wherein n is an integer ranging from 1-3;
• R.sup.1 and R.sup.2 are each independently selected from the group consisting of hydrogen and compounds having the formula (III):
• ##STR7## wherein R.sup.5, R.sup.6, and R.sup.7 are each independently selected from hydrogen, --OH, --CH.sub.2 OH, alkyl, alkoxy, phenyl, and mono-, di- or tri-hydroxy-substituted phenyl groups;
• and R.sup.3 and R.sup.4 are each independently selected from the group consisting of hydrogen and compounds having the formula (IV):
• ##STR8## wherein X', Y' and Z' are each independently selected from hydrogen, OH, --CH.sub.2 OH, --CH.sub.2 CH.sub.2 OH, --CH.sub.2 COOH, alkyl, or alkoxy group, and at least one of them is --OH or --CH.sub.2 OH or --CH.sub.2 CH.sub.2 OH.
• (d) from about 0 to about 20% by weight of water all percents based on the weight of the stripper composition.