Pattern forming material and process for forming pattern using the same
AssigneesHitachi, Ltd., Hitachi Chemical Company, Ltd.
InventorsTakumi Ueno, Hiroshi Shiraishi, Nobuaki Hayashi, Emiko Fukuma, Keiko Tadano
Life of this patent
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Abstract
A pattern can be formed on a substrated using a pattern forming material comprising (a) a medium, e.g. a polymer or compound, having reactivity for changing solubility in an alkali aqueous solution by a reaction using an acid as a catalyst, and (b) as an acid precursor an alkylsulfonic acid ester obtained from a compound having at least two phenolic hydroxyl groups.
Claims1
A compound obtained by reacting a phenolic compound having three or more phenolic hydroxyl groups selected from the group consisting of pyrogallol, phloroglucinol, trihydroxybenzophenone and tetrahydroxybenzophenone, with a reactive derivative of optionally chloro substituted alkylsulfonic acid, said obtained compound being capable of forming a compound having one or more phenolic hydroxyl groups and an alkylsulfonic acid when exposed to light or irradiation and is selected from the group consisting of tris(methanesulfonyloxy)benzene, tris(ethanesulfonyloxy)benzene, tris(propanesulfonyloxy)benzene, tris(butanesulfonyloxy)benzene, tris(methanesulfonyloxy)benzophenone, tetra(methanesulfonyloxy)benzophenone, and tris(trichloromethanesulfonyloxy)benzene.
Dependencies are inferred from the claim text.