Cantilever for atomic force microscope and method of manufacturing the cantilever

A method of manufacturing a cantilever for an atomic force microscope comprising:

• selectively etching a silicon substrate to form an etch pit in the substrate,
• forming a resist film on said silicon substrate and in the etch pit,
• forming a nitride film on said resist film,
• forming a glass base plate on said nitride film spaced from and not opposite the etch pit, and
• removing said silicon substrate.

A method of manufacturing a cantilever for an atomic force microscope comprising:

• selectively etching a silicon substrate to form an etch pit in the substrate,
• forming a nitride film on said silicon substrate and in the etch pit,
• forming a glass base plate on said nitride film spaced from and not opposite the etch pit,
• removing said silicon substrate, and
• forming a sputtered film on said nitride film.

A method of manufacturing a cantilever for an atomic force microscope comprising:

• selectively etching a silicon substrate to form an etch pit in the substrate,
• filling the etch pit with a resist film,
• forming a nitride film on said silicon substrate opposite the etch pit,
• forming a glass base plate on said nitride film spaced from and not opposite the etch pit, and
• removing said silicon substrate.

A method of manufacturing a cantilever for an atomic force microscope comprising:

• selectively etching a silicon substrate to form an etch pit in the substrate,
• forming a sputtered film in the etch pit in said silicon substrate,
• forming a resist film on said sputtered film, filling the etch pit with the sputtered and resist films,
• forming a nitride film on the surface of said silicon substrate opposite the etch pit,
• forming a glass base plate on said nitride film spaced from and not opposite the etch pit, and
• removing said silicon substrate.