Filter device
AssigneeTokyo Electron Limited
InventorsJunichi Kitano, Misako Saitou, Yuji Kakazu
Life of this patent
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Abstract
A filter device for a resist-treatment system, comprising a frame having an aperture through which the outside air is introduced into the resist-treatment system, a fan unit for sucking the outside air into the aperture, and a filter element supported by means of the frame so as to be situated at least on one side the fan unit, the filter element including a porous body containing an acid component capable of adsorbing an alkali component by reaction.
Claims20
A filter device for a resist-treatment system, comprising:
- a frame having an aperture through which the outside air is introduced into the resist-treatment system;
- sucking means for sucking the outside air into the aperture;
- and
- a filter element supported by means of the frame so as to be situated at least on one side the sucking means,
- the filter element including a porous body containing an acid component capable of adsorbing an alkali component by reaction.
A resist-treatment system having a filter means for removing impurities from the outside air, comprising:
- resist coating means for applying a resist to a substrate;
- baking means for baking the applied resist;
- developing means for developing the applied resist;
- and
- said filter means including a frame having an aperture through which the outside air is introduced into the resist-treatment system, sucking means for sucking the outside air into the aperture, and a filter element supported by means of the frame so as to be situated at least on one side the sucking means, the filter element including a porous body containing an acid component capable of adsorbing an alkali component by reaction.
Dependencies are inferred from the claim text.