Mark position detecting method and device for aligner and aligner having the device
AssigneeFujitsu Limited
InventorsMakio Suita, Hironobu Kitajima, Masaki Yamabe
Life of this patent
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AssigneeFujitsu Limited
InventorsMakio Suita, Hironobu Kitajima, Masaki Yamabe
Estimating the term…
Regarding a reflected light from any line portion, which is parallel to the longitudinal direction of the alignment mark 11, on the alignment mark 11, the cylindrical lens 33 functions merely as a glass plate, while the cylindrical lens 34 converges the light onto a pixel on the line sensor 35a, performing optical integration and simplifying image processing. Regarding a reflected light from any line portion, which is parallel to the lateral direction of the alignment mark 11, on the alignment mark 11, the cylindrical lens 34 functions merely as a glass plate, while the cylindrical lens 33 magnifies and forms a line image on the line sensor 35a along the pixel row of that. A toroidal lens can be used in place of the cylindrical lenses 33 and 34.
A mark position detecting method for aligning between a mask and a semiconductor wafer and exposing a pattern on said mask onto said wafer, said method detecting a position of a rectangular mark formed on an object which is either said wafer or said mask, said method comprising the steps of:
A mark position detecting device for an aligner which aligns between a mask and a semiconductor wafer and exposes a pattern on said mask onto said wafer, said device detecting a position of a rectangular mark formed on an object which is either said wafer or said mask, said object being positioned such that one of two sides of said rectangular mark becomes parallel to an X-direction and the other of said two sides becomes parallel to a Y-direction which is perpendicular to said X-direction, said device comprising:
An aligner for aligning between a mask and a semiconductor wafer and for exposing a pattern on said mask onto said wafer, said aligner detecting a position of a rectangular mark formed on an object which is either said wafer or said mask, said aligner comprising:
Dependencies are inferred from the claim text.