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US 5,399,448 AGranted
Reflection mask for X ray
AssigneeNikon Corporation
InventorsHiroshi Nagata, Katsuhiko Murakami, Hiroshi Nakamura
Life of this patent
Estimating the term…
Abstract
In reflection mask for X ray having a predetermined pattern formed by reflecting portions comprising multilayer film and a non-reflecting portion, the reflecting portions are designed for generating a phase difference between reflected lights from opposite sides of the non-reflecting portion.
Claims20
A reflection mask for X-ray, comprising:
- a substrate;
- an X-ray reflective multilayer film laminate disposed on said substrate and forming reflection portions of a predetermined pattern of reflection and non-reflection portions;
- an X-ray non-reflective film formed on said laminate in accordance with said predetermined pattern so as to form said non-reflection portions;
- and
- phase shifting means provided at one of two neighboring reflection portions at opposite sides of a non-reflection portion for generating a predetermined phase difference between reflected X-ray illumination from said one reflection portion and reflected X-ray illumination from the other of said two reflection portions.
2 more elements
A reflection mask for X-ray, comprising:
- an X-ray non-reflective substrate forming non-reflection portions of a predetermined pattern of reflection portions and non-reflection portions;
- an X-ray reflective multilayer film laminate which is formed on said substrate in accordance with said predetermined pattern so as to form said reflection portions;
- and
- phase shifting means providing a height difference, relative to a surface of said substrate, between two reflection portions at opposite sides of a non-reflection portion for generating a predetermined phase difference between reflected X-ray illumination from one of said two reflection portions and reflected X-ray illumination from the other of said two reflection portions.
1 more element
Dependencies are inferred from the claim text.