Method of forming diamond or diamond containing carbon film

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of:

• introducing a gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure;
• establishing a magnetic field and introducing a microwave into said plasma generating chamber in order to excite said gas;
• directing ionized or activated particles of said gas to a substrate placed on a substrate holder in a reaction chamber;
• introducing a carbon compound gas to said reaction chamber;
• and
• depositing a diamond or diamond containing carbon film on said substrate,
• wherein said carbon compound is an organic material whose molecules have a diamond structure;
• said substrate holder carrying said substrate is rotated during the deposition;
• and said carbon compound gas is introduced into said reaction chamber through an inlet port provided in said substrate holder.

A method of depositing diamond on a substrate comprising the steps of:

• inputting into a reaction chamber a reactive gas containing at least a carbon compound whose molecules have a diamond structure;
• introducing a microwave into said reaction chamber in order to excite said reactive gas;
• and
• depositing a diamond or a diamond containing carbon film on a substrate placed in said reaction chamber,
• wherein said carbon compound is selected from the group consisting of 1-adamantanol and 2-adamantanol and said substrate is maintained at a temperature not higher than 700.degree. C. during depositing, and
• wherein said reactive gas is introduced into said reaction chamber through an inlet port provided in a part of a substrate holder having said substrate thereon.

A method of depositing diamond or diamond containing carbon on a substrate comprising the steps of:

• introducing a first gas containing oxygen, hydrogen, or a mixture thereof into a plasma forming chamber;
• establishing a magnetic field in said plasma forming chamber;
• introducing a microwave into said plasma forming chamber in order to convert said first gas to plasma in the presence of said magnetic field;
• directing activated or ionized particles of said first gas from said plasma forming chamber to a deposition chamber provided adjacent to said plasma forming chamber;
• inputting a second gas containing a carbon compound whose molecules have a diamond structure into said deposition chamber;
• and
• depositing diamond or a diamond containing carbon on a substrate placed in said deposition chamber,
• wherein said second gas is introduced into said reaction chamber through an inlet port provided in a part of a substrate holder having said substrate thereon.

A method of forming a diamond film or a diamond containing carbon film on a substrate comprising the steps of:

• introducing a gas containing hydrogen, oxygen, or a mixture thereof into a plasma generating chamber maintained at a reduced pressure;
• establishing a magnetic field and introducing a microwave into said plasma generating chamber in order to excite said gas;
• directing ionized or activated particles of said gas to a substrate placed on a substrate holder in a reaction chamber;
• introducing a carbon compound gas comprising a carbon compound to said reaction chamber;
• and
• depositing a diamond or diamond containing carbon film on said substrate,
• wherein said carbon compound is an organic material whose molecules have a diamond structure and said carbon compound gas is introduced into said reaction chamber through an inlet port provided in said substrate holder.