Method of continuously forming a large area functional deposited film by microwave PCVD and apparatus for the same

An apparatus for continuously forming functional deposited film by a microwave PCVD method on an elongated member which is being continuously moved comprising:

• (i) a a first vacuum chamber and a second vacuum chamber disposed within said first vacuum chamber for forming a film, said second vacuum chamber having a side wall defined by said elongated member wherein means for supporting and conveying said elongated member is continuously moving said elongated member in the lengthwise direction of said elongated member;
• (ii) a microwave introduction opening for introducing microwave energy into said second vacuum chamber disposed in the first vacuum chamber;
• (iii) microwave applicator means for radiating microwave energy to generate plasma in said second vacuum chamber;
• (iv) means for continuously winding a movable sheet of a dielectric material in said first vacuum chamber, said movable sheet forming the second vacuum chamber and being in the vicinity of said microwave introduction opening;
• (v) exhaust means for exhausting said first and said second vacuum chamber;
• (vi) means for introducing a deposited film-forming raw material gas into said second vacuum chamber;
• and
• (vii) temperature control means for heating or cooling said elongated member.