Apparatus for optically forming pattern
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsKazuhiro Kobushi, Hironao Iwai
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Abstract
An apparatus for optically forming a pattern on an object using a reticle having an original pattern to be optically projected. The apparatus is equipped with a storage circuit for storing information indicative of an exposure condition for the reticle, the storage circuit being attached to the reticle. An exposure apparatus reads out the information from the storage circuit so as to project the original pattern of the reticle on the object in accordance with the read information so that a pattern corresponding to the original pattern is formed on the object. This arrangement can automatically and accurately set the exposure condition in the exposure apparatus.
Claims15
An apparatus for optically forming a pattern on an object, comprising:
- a reticle having an original pattern to be optically projected on said object;
- storage means for storing information indicative of an exposure condition for said reticle, said storage means being attached to said reticle;
- and
- exposure means coupled through signal input/output means to said storage means for projecting said original pattern of said reticle on said object in accordance with said information stored in said storage means so that a pattern corresponding to said original pattern is formed on said object.
An apparatus for optically forming a pattern on an object, comprising:
- a reticle having an original pattern to be optically projected on said object;
- a reticle case for encasing said reticle therein so as to allow the optical projection of said reticle;
- storage means for storing information indicative of an exposure condition for said reticle, said storage means being attached to said reticle case;
- and
- exposure means coupled through signal input/output means to said storage means for projecting said original pattern of said reticle on said object in accordance with said information stored in said storage means so that a pattern corresponding to said original pattern is formed on said object.
Dependencies are inferred from the claim text.