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US 5,394,219 AGranted
Exposure apparatus and method of exposure using the same
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorMiyuki Hirosue
Life of this patent
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Abstract
A first window portion is provided in a predetermined portion on a substrate where pellicle films of a photomask are not provided, and a second window portion is provided in a predetermined portion on substrate where pellicle films of the photomask are provided. By comparing amounts of exposure luminous flux transmitting first and second window portions it is possible to determine the life of pellicle films and the life of an exposure light source.
Claims3
An exposure apparatus, comprising:
- exposing means having an exposure light source emitting exposure luminous flux;
- a photomask having a predetermined pattern provided on a substrate and having an anti-particle film in a predetermined portion on the substrate;
- a first window portion provided in a predetermined portion on said substrate where said anti-particle of said photomask is not provided;
- a second window portion provided in a predetermined portion on said substrate where said anti-particle film of said photomask is provided;
- and
- means for measuring each amount of exposure of exposure luminous flux transmitting said first window portion and said second window portion, individually.
3 more elements
Dependencies are inferred from the claim text.