Fabrication of boron sputter targets
AssigneeThe Regents of the University of California
InventorsDaniel M. Makowiecki, Mark A. McKernan
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Abstract
A process for fabricating high density boron sputtering targets with sufficient mechanical strength to function reliably at typical magnetron sputtering power densities and at normal process parameters. The process involves the fabrication of a high density boron monolithe by hot isostatically compacting high purity (99.9%) boron powder, machining the boron monolithe into the final dimensions, and brazing the finished boron piece to a matching boron carbide (B.sub.4 C) piece, by placing aluminum foil there between and applying pressure and heat in a vacuum. An alternative is the application of aluminum metallization to the back of the boron monolithe by vacuum deposition. Also, a titanium based vacuum braze alloy can be used in place of the aluminum foil.
Claims13
A process for fabricating high density boron sputtering targets, comprising:
- providing a boron monolith;
- and
- reinforcing the boron monolith by providing aluminum metallization on one side of the boron monolith.
A process for producing high density boron sputtering targets comprising:
- forming a boron monolith from boron powder;
- and
- reinforcing the boron monolith by:
- providing a piece of boron carbide;
- positioning between the boron monolith and the piece of boron carbide a material selected from the group of aluminum foil and titanium containing vacuum braze alloy;
- and
- brazing the boron and boron carbide together to form a reinforced boron sputtering target.
A process for fabricating high density boron sputtering targets comprising:
- providing a boron monolith;
- and
- reinforcing the boron monolith by:
- providing a piece of B.sub.4 C;
- metallizing mating surfaces of the boron and B.sub.4 C;
- and
- brazing the metallized surfaces of the boron and B.sub.4 C together to form a reinforced boron sputtering target.
Dependencies are inferred from the claim text.