Method for removing impurities from resist components and novolak resins
AssigneeOCG Microelectronic Materials, Inc.
InventorKenji Honda
Life of this patent
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Abstract
A method of removing ionic impurities from a resist component, comprising the steps of: (a) dissolving said resist component in a solvent; (b) contacting said resist component solution with a fibrous ion exchange resin for a sufficient amount of time to remove at least a portion of said ionic impurities onto said fibrous ion exchange resin; and (c) separating said fibrous ion exchange resin bearing said ionic impurities from said resist component solution.
Claims11
A method of removing metal impurities from a novolak resin, comprising the steps of:
- (a) dissolving said novolak resin in a solvent;
- (b) contacting said novolak resin solution with at least one fibrous cation exchange resin for sufficient amount of time to transfer at least a major portion of said metal impurities onto said fibrous cation exchange resin, wherein said cation exchange resin is prewashed with a solution of a quaternary ammonium salt compound;
- and
- (c) separating said cation exchange resin bearing said metal impurities from said novolak resin solution.
A method of removing metal impurities from a resist component comprising the steps of:
- (a) dissolving said resist component in a solvent;
- (b) washing a fibrous cation exchange resin with a quaternary ammonium salt compound solution;
- (c) contacting said prewashed fibrous cation exchange resin with said resist component solution for a sufficient amount of time to remove at least a portion of said metal impurities onto said fibrous cation exchange resin;
- and
- (d) separating said cation exchange resin bearing said metal impurities from said resist component solution.
Dependencies are inferred from the claim text.