Total reflection X-ray diffraction micrographic method and apparatus
AssigneeNEC Corporation
InventorTomohisa Kitano
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Abstract
A method for detecting and evaluating crystal defects existing in the extreme neighborhood of the surface of a crystal specimen through the use of X-ray analyzing micrography. Synchrotron radiation is used as the X-ray source. A monochromatic X-ray beam generated from the synchrotron radiation is directed into the crystal specimen at a glancing angle smaller than the critical angle of said crystal specimen relative to said monochromatic X-ray beam. The diffracted X-rays from the crystal specimen due to asymmetrical reflection are detected in order to observe the resulting diffracted image.
Claims7
A total reflection X-ray diffraction micrographic method of detecting and evaluating defects present within a crystal specimen comprising the steps of:
- utilizing continuous wavelength spectrum synchrotron radiation;
- making said synchrotron radiation monochromatic in order to generate monochromatic X-ray beam;
- directing said monochromatic X-ray beam first into said crystal specimen at a glancing angle greater than the critical angle of said crystal specimen relative to said monochromatic X-ray beam, and then directing said monochromatic X-ray beam into said crystal specimen at a glancing angle smaller than said critical angle by turning said crystal specimen and by successively changing the wavelength of the monochromatic X-ray while continuously satisfying Bragg's condition;
- and
- detecting diffracted X-rays from said crystal specimen due to asymmetrical reflection in order to observe the resulting diffracted image.
Dependencies are inferred from the claim text.