High voltage tolerant voltage pump constructed for a low voltage CMOS process
AssigneeIntel Corporation
InventorMichael J. Allen
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AssigneeIntel Corporation
InventorMichael J. Allen
Estimating the term…
An integrated circuit charge pump which includes a pair of serially arranged P channel transistor devices connected with their source and drain terminals in series. The devices are constructed as N well devices in a P substrate. Using a pair of N well devices allows higher voltages to be divided and applied across the two devices without reaching the breakdown limits of either the oxide or the junctions between different portions of the devices used in the process. One of the devices has its body well connected to its drain terminal to provide a diode between the source and body well which allows the device to turn on and off when subject to a series of input pulses at its drain terminal. A third similarly biased N well P channel device is connected in series with the pair of P channel devices to provide the voltage pumping effect at an output terminal. These devices have been found capable of generating voltages levels of ten or more volts to circuitry for programming or erasing flash EEPROM cells even the they are a part of integrated circuitry designed for only 3.3 volt usage.
An integrated circuit charge pump circuit manufactured in a P- substrate material comprising:
An integrated circuit comprising:
An integrated circuit charge pump circuit comprising first, second, third, and fourth circuit nodes;
An integrated circuit comprising:
Dependencies are inferred from the claim text.