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US 5,352,917 AGranted
Electronic device provided with metal fluoride film
OwnerTadahiro Ohmiinventor
Life of this patent
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Abstract
An electronic device provided with a metal fluoride film which can be formed at a low temperature with a high processing accuracy, characterized in that the metal fluoride film is used in at least part of an insulting film.
Claims10
A semiconductor device comprising a metal fluoride film in at least part of an insulating film.
An electronic device comprising a metal fluoride film in at least part of an insulating film, wherein said metal fluoride film comprises a fluoride of nickel containing phosphorus.
Dependencies are inferred from the claim text.