Process for the preparation of an optical structure and optical structure obtained thereby
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsJean-Christophe Rostaing, Francois Coeuret
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Abstract
The invention concerns the preparation of an optical structure. On a polymeric substrate there is first provided a surface activation, and the deposit of a layer of SiO.sub.2, 2000 .ANG. thick after which there is a deposit of a plurality of functional layers and finally a deposit of SiO.sub.2, 3 microns thick followed by a deposit of Si.sub.3 N.sub.4 /SiO.sub.x N.sub.y 3 microns thick, the latter being produced under radio-frequency polarization. The thus obtained optical structure has properties of adhesiveness, resistance to abrasion and to thermal impacts.
Claims15
A process for producing an optical structure comprising a silicon-based coating on an optical polymeric substrate, comprising the following consecutive steps:
- (a) plasma-activating a surface of the substrate with plasma based upon a gaseous mixture containing argon to form an activated surface;
- (b) depositing a first layer of SiO.sub.2 onto the activated surface by a plasma enhanced chemical vapor deposition technique from silane and oxygen to form a first layer having a thickness of from about 2 to 5 microns;
- (c) coating said first layer by a plasma enhanced chemical vapor deposition technique while the substrate is subjected to radio-frequency biasing with a second layer formed of a silicon nitride.
The process for producing an optical structure comprising a silicon-based coating on an optical polymeric substrate, comprising the following consecutive steps:
- (a) plasma-activating a surface of the substrate with a plasma based upon a gaseous mixture containing argon to form a plasma-activated surface;
- (b) depositing a first layer of SiO.sub.2 onto the activated surface by plasma enhanced chemical vapor deposition from silane and oxygen to form a first layer having a thickness of from 2 to 5 microns;
- (c) coating said first layer by plasma enhanced chemical vapor deposition with a second layer, said second layer comprising a complex having a composition intermediate between SiO.sub.2 and Si.sub.3 N.sub.4 with a minimum of Si--Si bonds while the substrate is subjected to radio-frequency biasing.
In a process for producing an optical structure comprising a silicon-based coating on an optical polymeric substrate comprising plasma-activating a surface of the substrate, depositing a first layer of SiO.sub.2 onto the activated structure by plasma enhanced chemical vapor deposition technique from silane and oxygen to form a first layer;
- the improvement comprising coating said first layer by a plasma enhanced chemical vapor deposition technique with a second layer formed from a silicon nitride compound while the substrate is subjected to radio-frequency biasing.
In a process for producing an optical structure comprising a silicon-based coating on an optical polymeric substrate comprising plasma-activating a surface of the substrate, depositing a first layer of SiO.sub.2 onto the activated structure by plasma enhanced chemical vapor deposition technique from silane and oxygen to form a first layer;
- the improvement comprising coating said first layer by a plasma enhanced chemical vapor deposition technique with a second layer of a complex of a composition which is intermediate between SiO.sub.2 and Si.sub.3 N.sub.4 with a minimum number of Si--Si bonds while the substrate is subjected to radio-frequency biasing.
Dependencies are inferred from the claim text.