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US 5,350,499 AGranted
Method of producing microscopic structure
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorsNarito Shibaike, Michiyoshi Nagashima, Fumiaki Ueno, Toshinori Kishi
Life of this patent
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Abstract
A method of producing a microscopic structure by anisotropic etching, in which ion etcing is conducted by irradiating an ion beam emitted by an ion source over a workpiece while a direction of progress of the ion etching is being changed.
Claims2
A method of producing a microscopic structure by ion etching, in which an ion beam emitted by an ion source is irradiated over a workpiece by using a plurality of kinds of resists,
- wherein an angle of incidence of the ion beam relative to the workpiece is changeable,
- etching of an identical layer of the workpiece being repeated while changing the angle of incidence of the ion beam relative to the workpiece each time replacement of the resists is performed, whereby the workpiece has an irregular desired cross-sectional shape.
Dependencies are inferred from the claim text.