US 5,349,434 A · Method of measuring artifact taper

Abstract

An interferometer (14) performs three topographical measures of an artifact (12) to determine taper between opposing surfaces (50 and 52) of the artifact (12) mounted on three points of support (30, 32, and 34). Two sets of three data points (60, 62, and 64 and 68, 70, and 72) are extracted from the first topographical measure and are used to calculate irregularities in one of the opposing surfaces (50). The second two topographical measures are made of the other artifact surface (52). Taper between the opposing surfaces (50 and 52) is calculated independently of both the surface irregularities and any angular deviations of the three points of support (30, 32, and 34).

Claims27

Dependent claims

A method of measuring taper between two surfaces of an artifact comprising steps of:

measuring a first surface of the artifact;
calculating a first angular orientation of a first plane passing through a first set of three points on said first surface;
calculating a second angular orientation of a second plane passing through a second set of three points on said first surface;
inverting said artifact;
aligning said first set of three points with three points of support;
measuring a second surface of the artifact;
calculating a third angular orientation of said second surface;
rotating said artifact;
aligning said second set of three points with said three points of support;
remeasuring said second surface of the artifact;
calculating a fourth angular orientation of said second surface;
and
combining said first, second, third, and fourth angular orientations in a calculation for determining a fifth angular orientation between said first and second surfaces.

10 more elements

Dependencies are inferred from the claim text.

Method of measuring artifact taper

Life of this patent

Method of measuring artifact taper

Life of this patent

Abstract

Claims27