Photosensitive composition comprising alkali soluble binder and photoacid generator having sulfonyl group

A photosensitive composition comprising:

• an alkali-soluble resin;
• a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or an aminoplast resin which has a substituent group capable of crosslinking the alkali-soluble resin in the presence of an acid;
• and
• a compound which generates an acid upon exposure, which is represented by formula (2) given below:
• ##STR97## wherein each of R.sub.21 and R.sub.23 independently represents a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, and R.sub.22 represents a sulfonyl or carbonyl group.

A photosensitive composition comprising:

• an alkali-soluble resin;
• a compound which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group;
• and
• a compound which generates an acid upon exposure, which is represented by formula (3) given below:
• ##STR99## wherein each of R.sub.31, R.sub.32, and R.sub.35 independently represents a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, R.sub.33 represents hydrogen, a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, and R.sub.34 represents a sulfonyl group, a sulfinyl group, a sulfur atom, or a carbonyl group.

A photosensitive composition, comprising:

• an alkali-soluble resin;
• a dissolution inhibitor which has a substituent group decomposable by an acid and generates an alkali-soluble group upon decomposition of the substituent group, or an aminoplast resin which is capable of crosslinking the alkali-soluble resin in the presence of an acid;
• and
• a compound which generates an acid upon exposure, which is selected from the group consisting of the compounds represented by formulas (1) and (3) given below:
• ##STR101## wherein R.sub.11 represents a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced,
• each of R.sub.12, R.sub.13, and R.sub.14 independently represents hydrogen, a halogen atom, a nitro group, a cyano group, a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced,
• each of R.sub.21 and R.sub.23 independently represents a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced,
• R.sub.22 represents a sulfonyl or carbonyl group,
• each of R.sub.31, R.sub.32, and R.sub.35 independently represents a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced,
• R.sub.33 represents hydrogen, a monovalent organic group, or a monovalent organic group into which at least one substituent selected from the group consisting of a halogen atom, a nitro group, and a cyano group is introduced, and
• R.sub.34 represents a sulfonyl group, a sulfinyl group, a sulfur atom, and a carbonyl group, and
• wherein the solubility of said composition in an alkali solution is changed when exposed to radiation.